Tomoharu Fujiwara
at Nikon Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Reticles, Optical lithography, Scanners, Inspection, Time metrology, Process control, Semiconducting wafers, Data corrections

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Image processing, Scanners, Scanning electron microscopy, Signal processing, Optical alignment, Photoresist processing, Semiconducting wafers, System on a chip

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Scanners, Double patterning technology, Optical alignment, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Double positive medium

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Reticles, Scanners, Error analysis, Scatterometry, Process control, Immersion lithography, Critical dimension metrology, Semiconducting wafers, Data corrections

Proceedings Article | 10 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Polymers, Particles, Inspection, Scanning electron microscopy, Printing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Chemical species, Polymers, Scanners, Line width roughness, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Defect inspection

Showing 5 of 30 publications
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