Mr. TOMOHIKO TSUTSUMI
Manager at Merck Performance Materials Ltd.
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Line width roughness, Directed self assembly, Plasma etching, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Etching, Process control, Finite element methods, Line width roughness, Directed self assembly, Chemical analysis, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

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