Tomohiko Yamamoto
Engineer at Fujitsu Ltd
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Photomasks, Optical simulations, Optical proximity correction, SRAF, Convolution, Critical dimension metrology, Semiconducting wafers, Bessel functions, Optics manufacturing

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Chromatic aberrations, Reticles, Cadmium, Diffusion, Printing, Laser stabilization, Optical simulations, SRAF, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Reticles, Image quality, Design for manufacturing, Photomasks, Optical simulations, Double patterning technology, Logic devices, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Monochromatic aberrations, Reticles, Error analysis, Manufacturing, Inspection, Control systems, Scanning electron microscopy, Logic devices, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Lithography, Chromium, Photomasks, Mask making, Phase shifts

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Quartz, Chromium, Distortion, Bridges, Photomasks, Logic devices, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 6 publications
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