Tomohiro Goto
at SCREEN Holdings Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Optical lithography, Capillaries, Scanners, Finite element methods, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Standards development

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Particles, Dielectrics, Coating, Chemical vapor deposition, Immersion lithography, Thin film coatings, System integration, Semiconducting wafers, Edge roughness

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Diffractive optical elements, Particles, Silicon, Coating, Inspection, Scanning electron microscopy, Immersion lithography, Thin film coatings, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Ellipsometry, Refractive index, Atomic force microscopy, Scanning electron microscopy, Atomic force microscope, Semiconductor manufacturing, Head-mounted displays, Photoresist processing, Semiconducting wafers, Temperature metrology

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