Tomohiro Iseki
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Chemistry, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Lithography, Chemically amplified resists, Industrial chemicals, Floods, Light sources, Polymers, Picosecond phenomena, Ultraviolet radiation, Chemical reactions, Absorption

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

Proceedings Article | 20 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Bridges, Wafer manufacturing, Polymers, Capillaries, Yield improvement, NOx, Optical lithography

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Semiconducting wafers, Coating, Head-mounted displays, Immersion lithography, Particles, Control systems, Ions, Natural surfaces, Thin film coatings, Silicon

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