Dr. Tomohisa Fujisawa
at JSR Engineering Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 6 April 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, Chemically amplified resists

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Silica, Etching, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Silica, Water, Manufacturing, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Critical dimension metrology, Photoresist processing

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