Dr. Tomoki Nagai
at JSR Corp
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 27 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical lithography, Image processing, Ultraviolet radiation, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Absorption, Chemically amplified resists

Proceedings Article | 27 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Calibration, Polymers, Ultraviolet radiation, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Floods, Absorption, Chemically amplified resists

Proceedings Article | 5 May 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconductor manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Line edge roughness, Photoresist processing

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

Proceedings Article | 27 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Light sources, Polymers, Ultraviolet radiation, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Picosecond phenomena, Line edge roughness, Floods, Industrial chemicals, Absorption, Chemically amplified resists

Showing 5 of 18 publications
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