Tomoko Kamimoto
at Seiko Instruments Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Nanotechnology, Data compression, Manufacturing, Printing, Photomasks, Data conversion, Prototyping, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Manufacturing, Parallel processing, Data processing, Photomasks, Data conversion, Neodymium, Prototyping, Vestigial sideband modulation, Resolution enhancement technologies

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Data compression, Manufacturing, Inspection, Data processing, Software development, Photomasks, Optical proximity correction, Data conversion, Array processing

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Semiconductors, Data modeling, Manufacturing, Data processing, Photomasks, Optical proximity correction, Data conversion, Vestigial sideband modulation, Resolution enhancement technologies, Instrument modeling

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data compression, Data modeling, Manufacturing, Data processing, Software development, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development

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