Mr. Tomoyuki Ando
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electron beams, Etching, Polymers, Ultraviolet radiation, Silicon, Line edge roughness, Reactive ion etching, Fullerenes, Nanolithography

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Contamination, Scanners, Photomasks, Double patterning technology, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

SPIE Journal Paper | January 1, 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Photomasks, Line width roughness, Double patterning technology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Electron beams, Etching, Polymers, Ultraviolet radiation, Silicon, Scanning electron microscopy, Line edge roughness, Photoresist processing, Fullerenes, Nanolithography

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Water, Digital watermarking, Surface properties, Bridges, Chemical analysis, Immersion lithography, Semiconducting wafers, Standards development, Defect inspection

Showing 5 of 12 publications
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