Tomoyuki Ando
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 30 March 2010 Paper
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Fullerenes, Etching, Nanolithography, Electron beams, Lithography, Polymers, Reactive ion etching, Ultraviolet radiation, Line edge roughness, Silicon

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

SPIE Journal Paper | 1 January 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Fullerenes, Etching, Electron beams, Silicon, Nanolithography, Ultraviolet radiation, Photoresist processing, Line edge roughness, Polymers, Scanning electron microscopy

Showing 5 of 12 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top