Mr. Tomoyuki Matsuyama
Manager at Nikon Corp
SPIE Involvement:
Author
Publications (55)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Finite-difference time-domain method, Optical lithography, Lithographic illumination, Wavefronts, Computer simulations, 3D modeling, Projection systems, Photomasks

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Atrial fibrillation, Calibration, Scanners, Time metrology, Feedback loops, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Data modeling, Scanners, Photomasks, Optical simulations, Immersion lithography, Optical proximity correction, Critical dimension metrology, Photoresist processing, Performance modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Sensors, Ions, Control systems, Distortion, Printing, Image sensors, Optical scanning, Immersion lithography

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | December 2, 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

Showing 5 of 55 publications
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