Mr. Tomoyuki Takeishi
at Toshiba Corp
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Water, Particles, Silicon, Coating, Inspection, Digital watermarking, Wafer inspection, Immersion lithography, Semiconducting wafers, Wafer testing

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Silicon, Manufacturing, Control systems, Process control, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process engineering

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Water, Silicon, Coating, Digital watermarking, Scanning electron microscopy, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Particles, Inspection, Optical testing, Scanning electron microscopy, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Natural surfaces, Process engineering, Defect inspection

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Thin films, Lithography, Optical lithography, Cameras, Video, Particles, Laser ablation, Optical alignment, Photoresist processing, Natural surfaces

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