Dr. Ton Kiers
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Etching, Semiconducting wafers, Lithography, Diffractive optical elements, Plasma, Optical lithography, Atomic layer deposition, Critical dimension metrology, Image processing, Deposition processes

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Distortion, Scanning electron microscopy, Metrology, Data corrections, Image quality, Tolerancing, Optical proximity correction, Optical lithography, Visualization, Critical dimension metrology, Data modeling, Semiconducting wafers, Distance measurement, Error analysis, Calibration, Mathematical modeling, Performance modeling

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Etching, Metrology, Lithography, Scanning electron microscopy, Inspection, Process control, Manufacturing, Process engineering, Chemical mechanical planarization, Copper, Semiconducting wafers, Metals, Image processing, Optical alignment

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet, Lithography, Image processing, Edge roughness, Imaging arrays, Extreme ultraviolet lithography, Line edge roughness, Optical lithography, Critical dimension metrology, Stochastic processes, Etching, Logic, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Optical lithography, Extreme ultraviolet, Back end of line, Metals, Logic, Extreme ultraviolet lithography, Etching, Double patterning technology, Lithography, Photomasks, Stochastic processes, System on a chip, Semiconducting wafers, Critical dimension metrology

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Semiconducting wafers, Photoresist processing, Source mask optimization, Overlay metrology

Showing 5 of 13 publications
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