Dr. Ton Kiers
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Optical lithography, Statistical analysis, Etching, Error analysis, Reliability, Control systems, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Etching, Image processing, Atomic layer deposition, Deposition processes, Critical dimension metrology, Semiconducting wafers, Plasma

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Etching, Metals, Image processing, Copper, Manufacturing, Inspection, Scanning electron microscopy, Process control, Optical alignment, Semiconducting wafers, Process engineering, Chemical mechanical planarization

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mathematical modeling, Metrology, Optical lithography, Data modeling, Visualization, Calibration, Error analysis, Distortion, Scanning electron microscopy, Image quality, Distance measurement, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Performance modeling, Data corrections

Proceedings Article | 27 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Imaging arrays, Stochastic processes, Overlay metrology, Edge roughness

Showing 5 of 14 publications
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