Dr. Ton Kiers
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Etching, Image processing, Atomic layer deposition, Deposition processes, Critical dimension metrology, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mathematical modeling, Metrology, Optical lithography, Data modeling, Visualization, Calibration, Error analysis, Distortion, Scanning electron microscopy, Image quality, Distance measurement, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Performance modeling, Data corrections

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Etching, Metals, Image processing, Copper, Manufacturing, Inspection, Scanning electron microscopy, Process control, Optical alignment, Semiconducting wafers, Process engineering, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Imaging arrays, Stochastic processes, Overlay metrology, Edge roughness

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, System on a chip, Back end of line

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Source mask optimization, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 13 publications
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