Reducing the reflection of silicon surface is an effective way to enhance its optical absorption performance in optical and optoelectronic devices. In this paper, the influence mechanism of heat accumulation effect existing in the material substrate on the multi-scale porosity properties of surface structure during femtosecond laser irradiation is investigated. Micro-nano structures will lose their multi-scale porous properties at high-repetition-rate laser irradiation due to excessive agglomeration, nucleation or melting. By rapidly cooling the material substrate, the porosity of surface micro-nano structure are optimized, and the antireflection performance of the material surface is improved obviously. Our study opens a novel and convenient route for preparation of broadband antireflective black silicon surfaces for various applications.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.