Dr. Tonmoy Chakraborty
Postdoc at Univ of Texas Southwestern Medical Ctr at Dallas
SPIE Involvement:
Publications (5)

Proceedings Article | 1 May 2017 Presentation + Paper
Proceedings Volume 10222, 102220R (2017) https://doi.org/10.1117/12.2262692
KEYWORDS: Glasses, Refractive index, Liquid crystal on silicon, Spatial light modulators, Signal to noise ratio, Phase measurement, Distance measurement

Proceedings Article | 20 May 2016 Paper
Proceedings Volume 9870, 98700C (2016) https://doi.org/10.1117/12.2222157
KEYWORDS: Phase imaging, Spatial frequencies, Phase measurement, Phase retrieval, Convolution, Bessel functions, Sensors, Spatial light modulators, Fourier transforms, Cameras

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424
KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

Proceedings Article | 17 April 2014 Paper
Diego Alvarado, Yudhishthir Kandel, Jaewoong Sohn, Tonmoy Chakraborty, Dominic Ashworth, Gregory Denbeaux
Proceedings Volume 9048, 90481A (2014) https://doi.org/10.1117/12.2046613
KEYWORDS: Contamination, Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Ruthenium, Semiconducting wafers, Extreme ultraviolet, Sulfur, Mirrors, Photoresist processing

Proceedings Article | 17 April 2012 Paper
Jenah Harris-Jones, Vibhu Jindal, C. C. Lin, Tonmoy Chakraborty, Emilio Stinzianni, Ranganath Teki, Hyuk Joo Kwon
Proceedings Volume 8352, 83520Y (2012) https://doi.org/10.1117/12.922909
KEYWORDS: Extreme ultraviolet, Photomasks, Transmission electron microscopy, Metrology, Scanning electron microscopy, Deposition processes, Spectroscopy, Atomic force microscopy, Extreme ultraviolet lithography, Ions

  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top