Tonmoy Chakraborty
Student at Univ at Albany
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 1 May 2017
Proc. SPIE. 10222, Computational Imaging II
KEYWORDS: Signal to noise ratio, Refractive index, Glasses, Spatial light modulators, Liquid crystal on silicon, Distance measurement, Phase measurement

Proceedings Article | 20 May 2016
Proc. SPIE. 9870, Computational Imaging
KEYWORDS: Spatial frequencies, Cameras, Sensors, Fourier transforms, Spatial light modulators, Phase retrieval, Phase imaging, Convolution, Phase measurement, Bessel functions

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Contamination, Hydrogen, Reflectivity, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Mirrors, Contamination, Sulfur, Hydrogen, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Ruthenium

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Metrology, Spectroscopy, Ions, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes

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