Tony DiBiase
Principle at AAMILIA
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Overlay metrology, Semiconducting wafers, Double patterning technology, Lithography, Semiconductors, Defect inspection, Scanning electron microscopy, Logic, Polymers, Photomasks

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet lithography, Inspection, Particles, Scanning electron microscopy, Wafer inspection, Defect inspection, Silicon

SPIE Journal Paper | 1 July 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Line width roughness, Critical dimension metrology, Metrology, Immersion lithography, Process control, Etching, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Optical lithography

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Nanoimprint lithography, Reticles, Inspection, Manufacturing, Lithography, Photomasks, Etching, Quartz, Defect inspection, Image transmission

Proceedings Article | 4 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Sensors, Inspection, Lithography, Semiconducting wafers, Defect inspection, Defect detection, Crystals, Detector development, Deep ultraviolet

Showing 5 of 8 publications
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