Tony DiBiase
Principle at nexAPP
SPIE Involvement:
Senior status | Author
Publications (8)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Logic, Polymers, Scanning electron microscopy, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Particles, Silicon, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

SPIE Journal Paper | 1 July 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Line width roughness, Critical dimension metrology, Metrology, Immersion lithography, Process control, Etching, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Optical lithography

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Reticles, Etching, Quartz, Manufacturing, Inspection, Image transmission, Photomasks, Nanoimprint lithography, Defect inspection

Proceedings Article | 4 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Defect detection, Deep ultraviolet, Sensors, Crystals, Inspection, Detector development, Photomasks, Semiconducting wafers, Defect inspection

Showing 5 of 8 publications
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