Prof. Torben Heins
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Metrology, Opacity, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Scanners, Manufacturing, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Metrology, Opacity, Etching, Ultraviolet radiation, Microscopy, Electrons, Scanning electron microscopy, Photomasks, Scanning probe microscopy, Critical dimension metrology

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Metrology, Calibration, Etching, Dry etching, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Phase shifts

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Lithography, Electron beams, Electron microscopes, Scanning electron microscopy, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Standards development

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