Prof. Torben Heins
at Advanced Mask Technology Ctr
SPIE Involvement:
Publications (5)

Proceedings Article | 3 May 2007 Paper
J. Richter, T. Heins, R. Liebe, B. Bodermann, A. Diener, D. Bergmann, C. Frase, H. Bosse
Proceedings Volume 6533, 65330S (2007)
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Photomasks, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Standards development, Opacity, Metrology

Proceedings Article | 20 October 2006 Paper
Uwe Dersch, Rico Buettner, Christian Chovino, Steffen Franz, Torben Heins, Holger Herguth, Jan Hendrik Peters, Thomas Rode, Florian Letzkus, Joerg Butschke, Mathias Irmscher
Proceedings Volume 6349, 63492G (2006)
KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Reflectivity, Manufacturing, Extreme ultraviolet lithography, Scanners, Optical lithography, Photoresist processing, Chromium

Proceedings Article | 21 June 2006 Paper
F. Gans, R. Liebe, Th. Heins, J. Richter, W. Häβler-Grohne, C. Frase, B. Bodermann, S. Czerkas, K. Dirscherl, H. Bosse
Proceedings Volume 6281, 62810D (2006)
KEYWORDS: Scanning probe microscopy, Scanning electron microscopy, Critical dimension metrology, Photomasks, Ultraviolet radiation, Metrology, Microscopy, Opacity, Electrons, Etching

Proceedings Article | 20 May 2006 Paper
Jan Richter, Roman Liebe, Frank Laske, Jens Rudolf, Torben Heins
Proceedings Volume 6283, 628315 (2006)
KEYWORDS: Critical dimension metrology, Photomasks, Calibration, Scanning electron microscopy, Etching, Dry etching, Metrology, Photoresist processing, Phase shifts, Atomic force microscopy

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521O (2006)
KEYWORDS: Line edge roughness, Photomasks, Semiconducting wafers, Lithography, Scanning electron microscopy, Electron microscopes, Standards development, Semiconductors, Critical dimension metrology, Electron beams

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