Dr. Torsten Feigl
CEO at optiX fab GmbH
SPIE Involvement:
Author
Publications (47)

Proceedings Article | 6 July 2018 Paper
Proc. SPIE. 10699, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray
KEYWORDS: Mirrors, Spectrographs, Multilayers, Reflectivity, Extreme ultraviolet, Boron, Vacuum ultraviolet, Stochastic processes, Solar processes

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Diffusers, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum

Proceedings Article | 16 March 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Diffraction, Optical filters, Mirrors, Multilayers, Reflectivity, Carbon dioxide lasers, Infrared radiation, Extreme ultraviolet, Spherical lenses, Binary data

Proceedings Article | 3 May 2013 Paper
Proc. SPIE. 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
KEYWORDS: Mirrors, Multilayers, Beam splitters, Reflection, Silicon, Reflectivity, Wavefronts, Extreme ultraviolet, Laser damage threshold, Plasma

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Multilayers, Light sources, Optical coatings, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics, Plasma, Tin

Showing 5 of 47 publications
Conference Committee Involvement (1)
Optical Constants of Materials for UV to X-Ray Wavelengths
4 August 2004 | Denver, Colorado, United States
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