Toru Ikegami
Process Control Systems Solution Development Dept at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Etching, Data processing, Process control, Critical dimension metrology, Reactive ion etching, Algorithm development, Data communications, Semiconducting wafers

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Edge detection, Metrology, Error analysis, Electron microscopes, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Metals, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Electron beams, Metrology, Contamination, Image resolution, Electron microscopes, Scanning electron microscopy, Optical alignment, Critical dimension metrology, Semiconducting wafers

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