Toru Ikegami
at Hitachi High-Tech Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Etching, Data processing, Process control, Critical dimension metrology, Reactive ion etching, Algorithm development, Data communications, Semiconducting wafers

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Edge detection, Metrology, Error analysis, Electron microscopes, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Line edge roughness, Edge roughness

Proceedings Article | 4 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Metals, Scatterometry, Extreme ultraviolet, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Scatter measurement

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Electron beams, Metrology, Contamination, Image resolution, Electron microscopes, Scanning electron microscopy, Optical alignment, Critical dimension metrology, Semiconducting wafers

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