Toru Ishimoto
Manager at Hitachi High-Tech Corp
SPIE Involvement:
Publications (17)

SPIE Journal Paper | 12 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

Proceedings Article | 28 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Image acquisition, Atomic force microscopy, Scanning electron microscopy, Time metrology, Finite element methods, Line width roughness, Semiconducting wafers, Standards development

Proceedings Article | 19 March 2018 Presentation
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Annealing, Directed self assembly, High volume manufacturing, Nanolithography, Thin film manufacturing, Resolution enhancement technologies, Temperature metrology

Proceedings Article | 28 March 2017 Presentation + Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Metrology, Logic, Statistical analysis, Etching, Germanium, Resistance, Scanning electron microscopy, 3D metrology, Process control, Critical dimension metrology, Algorithm development, Overlay metrology, Standards development, Back end of line

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Showing 5 of 17 publications
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