Dr. Toru Komizo
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Manufacturing, Reflectivity, Atomic force microscopy, Optical testing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Deep ultraviolet, Reflection, Imaging systems, Scanners, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 17 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Optical microscopes, Switches, Switching, Ultraviolet radiation, Silicon, Lamps, Inspection, Chromium, Photomasks, Semiconducting wafers

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Deep ultraviolet, Photography, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 26 publications
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