Dr. Toru Mikami
at Toshiba Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Metals, Silicon, 3D modeling, Scatterometry, Software development, Transistors, Electromagnetic theory, Systems modeling, Diffraction gratings

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Data modeling, Silicon, Atomic force microscopy, Photoresist materials, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Reticles, Metrology, Statistical analysis, Error analysis, Manufacturing, Process control, Critical dimension metrology, Semiconducting wafers, Neptunium

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Polarization, Birefringence, Image processing, Dielectrics, Inspection, Reflectivity, Semiconducting wafers, Wafer testing, Dielectric polarization, New and emerging technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top