Toshiaki Motonaga
Marketing Manager at DNP Europa GmbH
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diamond machining, Etching, Dry etching, Image processing, Chromium, Atomic force microscopy, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Plasma

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Diamond machining, Etching, Dry etching, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Plasma

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Phase shifting, Defect detection, Etching, Quartz, Dry etching, Inspection, Photomasks, Photomask technology

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Opacity, Etching, Quartz, Inspection, Chromium, Transmittance, Plasma etching, Critical dimension metrology, Tantalum, Plasma

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Lithography, Quartz, Silicon, Inspection, Reflectivity, Laser irradiation, Transmittance, Photomasks, Tantalum, Phase shifts

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