Toshifumi Suganaga
at SELETE
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Optical lithography, Chromium, Scanning electron microscopy, Transmittance, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Fabrication, Semiconductors, Lithography, Lithographic illumination, Transmittance, Photomasks, Nanoimprint lithography, Line edge roughness, Photoresist processing, Resolution enhancement technologies

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Target detection, Lithography, Monochromatic aberrations, Optical transfer functions, Point spread functions, Imaging systems, Fourier transforms, Wavefronts, Zernike polynomials, Spherical lenses

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Quartz, Image resolution, Chromium, Photomasks, Nanoimprint lithography, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 16 publications
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