Toshifumi Suganaga
at SELETE
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Photomasks, Binary data, Phase shifts, Lithography, Nanoimprint lithography, Transmittance, Optical lithography, Chromium, Scanning electron microscopy, Resolution enhancement technologies

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Line edge roughness, Lithographic illumination, Resolution enhancement technologies, Photoresist processing, Transmittance, Semiconductors, Fabrication

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Monochromatic aberrations, Wavefronts, Lithography, Imaging systems, Point spread functions, Spherical lenses, Optical transfer functions, Zernike polynomials, Fourier transforms, Target detection

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Nanoimprint lithography, Line edge roughness, Lithography, Photomasks, Tolerancing, Phase shifting, Binary data, Objectives, Resolution enhancement technologies, Lithographic illumination

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Photomasks, Nanoimprint lithography, Lithographic illumination, Chromium, Quartz, Semiconducting wafers, Resolution enhancement technologies, Image resolution, Optical lithography

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Reactive ion etching, Lithography, Photomasks, Photoresist processing, Etching, Binary data, Semiconductors, Optical lithography, Lithographic illumination, Line edge roughness

Showing 5 of 16 publications
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