Toshifumi Suganaga
Engineer at Renesas Technology Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 11 April 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Contamination, Scanners, Chemical analysis, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers, Absorption, Defect inspection

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Contamination, Statistical analysis, Ions, Adsorption, Chemical analysis, Immersion lithography, Neodymium, Technetium, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Lithography, Ions, Scanning electron microscopy, Bridges, Resonance energy transfer, Immersion lithography, Critical dimension metrology, Thin film coatings, Semiconducting wafers

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Polymers, Scanners, Manufacturing, Optical coatings, Scanning electron microscopy, Resonance energy transfer, Immersion lithography, Technetium, Optics manufacturing

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