Toshifumi Yokoyama
Manager at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Photomask
Websites:
Publications (17)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Diffraction, 3D modeling, Image analysis, Scanning electron microscopy, 3D printing, Printing, 3D metrology, Photomasks, Critical dimension metrology

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffractive optical elements, Etching, Chromium, Process control, Photomasks, Line width roughness, Cadmium sulfide, SRAF, Mask making, Photoresist processing

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Lithographic illumination, Polarization, Birefringence, Quartz, Pellicles, Printing, Photomasks, Semiconducting wafers

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Light sources, Birefringence, Quartz, Manufacturing, Pellicles, Thermal effects, Photomasks, Semiconducting wafers, Standards development

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polarization, Birefringence, Wave plates, Electroluminescence, Photomasks, Cadmium sulfide, Critical dimension metrology, Tolerancing, Lawrencium

Showing 5 of 17 publications
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