Toshifumi Yokoyama
Manager at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Photomask
Websites:
Publications (17)

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Photomasks, 3D modeling, Diffraction, 3D metrology, Lithography, Scanning electron microscopy, Critical dimension metrology, Printing, 3D printing, Image analysis

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Photomasks, Birefringence, Semiconducting wafers, Pellicles, Lithography, Lithographic illumination, Quartz, Polarization, Printing, Wafer-level optics

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Birefringence, Photomasks, Pellicles, Quartz, Lithography, Semiconducting wafers, Thermal effects, Manufacturing, Standards development, Light sources

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

Showing 5 of 17 publications
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