Dr. Toshiharu Nakashima
at Nikon Corp
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 15 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Mirrors, Optical lithography, Wavefronts, Control systems, Deformable mirrors, Distortion, Projection systems, Performance modeling, Overlay metrology

SPIE Journal Paper | 4 March 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Projection systems, Image processing, Fourier transforms, Optical spheres, Diffraction, Photomasks, Wave propagation, Optical lithography, Lithography, Radio propagation

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Optical spheres, Wave propagation, Projection systems, Transmittance, Photomasks, Geometrical optics, Semiconducting wafers

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Error analysis, Reliability, Near field, Photomasks, Source mask optimization, Chemical elements, Optimization (mathematics), Semiconducting wafers, Maxwell's equations

Showing 5 of 26 publications
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