Toshiharu Wada
at Tokyo Electron Miyagi Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 29 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Extreme ultraviolet, Plasma treatment, Line width roughness, Line edge roughness, Photoresist materials, Integrated circuits, Immersion lithography, 193nm lithography, Lithography, Lead

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers

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