Dr. Toshihiko P. Tanaka
Group Leader at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (51)

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Defect detection, Imaging systems, Light scattering, Inspection, Atomic force microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Inspection, Defect detection, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect inspection, Extreme ultraviolet lithography, Printing, Multilayers

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Signal to noise ratio, Defect detection, Image processing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Logic, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Electronic design automation, Model-based design

PROCEEDINGS ARTICLE | April 6, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Defect detection, Cameras, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Signal detection

SPIE Journal Paper | April 1, 2011
JM3 Vol. 10 Issue 02
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Multilayers, Reflectivity, Deep ultraviolet, Lithography, Semiconducting wafers, Reticles, Visible radiation

Showing 5 of 51 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top