Dr. Toshihisa Nozawa
Senior Director at ASM Japan KK
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 17, 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Argon, Gases, Magnetism, Transition metals, Platinum, Reactive ion etching, Plasma generation, Semiconducting wafers, Plasma

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