Toshimichi Iwai
Director at Advantest Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Databases, Inspection, Scanning electron microscopy, Optical inspection, 3D metrology, Photomasks, Semiconducting wafers, 3D image processing, Defect inspection

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Electron beams, 3D acquisition, Sensors, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Extreme ultraviolet, Phase measurement, 3D vision, 3D image processing

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Sensors, Databases, Inspection, Scanning electron microscopy, Image quality, 3D metrology, Photomasks, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Electron beams, Metrology, Scanning electron microscopy, Capacitance, Photomasks, Line scan image sensors, Absorption

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Edge detection, Sensors, Atomic force microscopy, Scanning electron microscopy, Image sensors, 3D metrology, Photomasks, Extreme ultraviolet, Signal detection

PROCEEDINGS ARTICLE | May 19, 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Electron beams, Metrology, Detection and tracking algorithms, Sensors, Scanning electron microscopy, 3D metrology, Photomasks, Algorithm development, Signal detection, Polonium

Showing 5 of 12 publications
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