Toshio Konishi
Manager at Toppan Printing Co Ltd
SPIE Involvement:
Conference Program Committee | Conference Chair | Author
Publications (22)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Manufacturing, Reflectivity, Atomic force microscopy, Optical testing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Defect detection, Deep ultraviolet, Polarization, Opacity, Inspection, Photomasks, Extreme ultraviolet, Critical dimension metrology, EUV optics, Defect inspection

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Deep ultraviolet, Reflection, Ultraviolet radiation, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Deep ultraviolet, Reflection, Imaging systems, Scanners, Manufacturing, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Semiconductor manufacturing, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Microscopes, Electron beams, Etching, Reflectivity, Bridges, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Lawrencium

Showing 5 of 22 publications
Conference Committee Involvement (6)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Photomask Japan 2011
13 April 2011 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Showing 5 of 6 published special sections
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