Mr. Toshio Suzuki
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metrology, Data storage, Metals, Inspection, Printing, Photomasks, Data conversion, Data storage servers, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Data modeling, Data storage, Manufacturing, Inspection, Computing systems, Photomasks, Raster graphics, Data conversion, Standards development, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Nanotechnology, Manufacturing, Inspection, Printing, Data processing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Inspection, Printing, Photomasks, Optical proximity correction, Data conversion, Electronic design automation, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Manufacturing, Inspection, Inspection equipment, Photomasks, Integrated circuits, Mask making, Data conversion, Standards development, Vestigial sideband modulation, Resolution enhancement technologies

Showing 5 of 10 publications
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