Toshiya Kotani
Group Manager at Toshiba Corp
SPIE Involvement:
Publications (39)

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10962, 109620T (2019)
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image classification, Photomasks, System on a chip, Convolution, Wafer inspection

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10588, 105880I (2018)
KEYWORDS: Semiconducting wafers, Optical proximity correction, Wafer-level optics, Lithography, Feature extraction, Computer simulations, Photomasks, Calibration

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 97810H (2016)
KEYWORDS: Neural networks, Feature extraction, Lithography, Machine learning, Data modeling, Optical lithography, Optics manufacturing, Evolutionary algorithms, Detection and tracking algorithms, Design for manufacturing, Denoising, Stochastic processes, Extreme ultraviolet lithography

Proceedings Article | 26 March 2015 Paper
Taiki Kimura, Yuki Watanabe, Toshiya Kotani
Proceedings Volume 9426, 942610 (2015)
KEYWORDS: Etching, Lithography, Scanning electron microscopy, Photoresist processing, Lithographic illumination, Image processing, Wafer-level optics, Semiconducting wafers, Immersion lithography, Optical simulations

Proceedings Article | 26 March 2015 Paper
Proceedings Volume 9427, 942708 (2015)
KEYWORDS: Photomasks, Optical lithography, Lithography, Image processing, Double patterning technology, Semiconducting wafers, Metals, Standards development, Semiconductors, Manufacturing

Showing 5 of 39 publications
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