Toshiya Kotani
Group Manager at Toshiba Corp
SPIE Involvement:
Publications (39)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Wafer inspection, Photomasks, Image classification, Convolution, Critical dimension metrology, Semiconducting wafers, System on a chip

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Wafer-level optics, Lithography, Calibration, Computer simulations, Feature extraction, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Data modeling, Denoising, Feature extraction, Neural networks, Design for manufacturing, Machine learning, Extreme ultraviolet lithography, Optics manufacturing, Stochastic processes, Evolutionary algorithms

Proceedings Article | 26 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Lithographic illumination, Etching, Image processing, Scanning electron microscopy, Optical simulations, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Metals, Image processing, Manufacturing, Photomasks, Double patterning technology, Semiconducting wafers, Standards development

Showing 5 of 39 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top