Toshiya Umeda
Executive Manager/Development at Adhand Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | November 14, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Carbon, Polymethylmethacrylate, Air contamination, Polymers, Composites, Ions, Particle filters, Photomasks, Chemical analysis, Neodymium

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Contamination, Air contamination, Polymers, Glasses, Scanners, Particles, Inspection, Photomasks, Adhesives

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