Toshiyuki Hisamura
Principal Engineer/Sr. Manager, Silicon Technology at Xilinx Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (2)

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Silicon, Diffusion, Field programmable gate arrays, Photomasks, Double patterning technology, Optical proximity correction, Optical alignment, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Air contamination, Manufacturing, Field programmable gate arrays, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers, Failure analysis, Resolution enhancement technologies

Conference Committee Involvement (1)
Optical Microlithography XXXIII
23 February 2020 | San Jose, California, United States
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