Prof. Toshiyuki Horiuchi
Professor at Tokyo Denki Univ
SPIE Involvement:
Conference Chair | Symposium Chair | Conference Co-Chair | Conference Program Committee | Author | Editor
Publications (17)

PROCEEDINGS ARTICLE | September 5, 2017
Proc. SPIE. 10372, Material Technologies and Applications to Optics, Structures, Components, and Sub-Systems III
KEYWORDS: Diffusion, Visualization, Liquids, Lithography, Epoxies, Optical lithography, Visual analytics, Chemical analysis

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconducting wafers, Printing, Optical lithography, Electroplating

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Lithography, Projection systems, Aluminum, Ultrasonics

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Wet etching, Optical lithography, Printing

PROCEEDINGS ARTICLE | May 16, 2017
Proc. SPIE. 10232, Micro-structured and Specialty Optical Fibres V
KEYWORDS: Light emitting diodes, Polymer optical fibers, Lithography, Printing, Optical fibers, Optical arrays, Heat treatments, Optical lithography, LCDs, Lamps, Aluminum, Transmittance, Polishing

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Reticles, Optical lithography, Printing, 3D scanning, Photomasks, Next generation lithography mask technology, Current controlled current source, Light sources, Mercury

Showing 5 of 17 publications
Conference Committee Involvement (9)
Photomask Japan 2008
16 April 2008 | Yokohama, Japan
Photomask and NGL Mask Technology XV
16 April 2008 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Showing 5 of 9 published special sections
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