Travis Brist
Senior Product Marketing Manager at Synopsys Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Metrology, Data modeling, Manufacturing, Feature extraction, Scanning electron microscopy, Dysprosium, Optical proximity correction, Semiconducting wafers, Data analysis

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Computer aided design, Critical dimension metrology, Semiconducting wafers, Electronic design automation

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Tolerancing

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Data modeling, Calibration, Scanning electron microscopy, Data visualization, Optical proximity correction, Statistical modeling, Process modeling, Data analysis

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Logic, Lithium, Manufacturing, Electroluminescence, Data processing, Photomasks, Computed tomography, Optical proximity correction, Electronic design automation

Showing 5 of 19 publications
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