Trent Hutchinson
SPIE Involvement:
Publications (12)

Proceedings Article | 24 March 2017 Paper
Félix Dufaye, Carlo Pogliani, Charles Crawford, Trent Hutchinson, Nicolas Thivolle, Laurent Lecarpentier, Frank Sundermann, Andrea Galbiati
Proceedings Volume 10147, 101471Z (2017)
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Logic, Transmission electron microscopy, Defect inspection, Inspection, Process control, Scanning electron microscopy, Reticles

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 963511 (2015)
KEYWORDS: Inspection, Photomasks, Reticles, Defect detection, Semiconducting wafers, Optical proximity correction, Databases, Lithography, SRAF, Printing

Proceedings Article | 1 October 2013 Paper
In Yong Kang, Gisung Yoon, Jonghee Lee, Donghoon Paul Chung, Byung-Gook Kim, Chan-Uk Jeon, Gregg Inderhees, Trent Hutchinson, Wonil Cho, Jiuk Hur
Proceedings Volume 8886, 88860O (2013)
KEYWORDS: Inspection, Photomasks, SRAF, Printing, Source mask optimization, Calibration, Model-based design, Scanners, Lithography, Image processing

Proceedings Article | 5 April 2012 Paper
Kin Wai Tang, Teng Hwee Ng, Lei Huang, Susan Ng, Thomas Ku, Wee Teck Chia, Lin Chua, William Li, Aaron Chin, Aditya Dayal, Tom Vavul, Trent Hutchinson
Proceedings Volume 8324, 83242W (2012)
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Inspection, Scanners, Yield improvement, Scanning electron microscopy, Information fusion, Calibration, Transistors

Proceedings Article | 26 May 2010 Paper
Kangjoon Seo, MunSik Kim, Sang Chul Kim, JaeCheon Shin, ChangYeol Kim, John Miller, Aditya Dayal, Trent Hutchinson, KiHun Park
Proceedings Volume 7748, 77480N (2010)
KEYWORDS: Photomasks, Reticles, Inspection, Critical dimension metrology, Reflectivity, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Data processing, Scanners

Showing 5 of 12 publications
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