Trent Hutchinson
Retired at
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Reticles, Logic, Inspection, Scanning electron microscopy, Transmission electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Defect inspection

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Calibration, Image processing, Scanners, Inspection, Printing, Photomasks, Source mask optimization, SRAF, Model-based design

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Information fusion, Reticles, Calibration, Scanners, Inspection, Scanning electron microscopy, Transistors, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 26 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Showing 5 of 12 publications
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