Dr. Trey Graves
Research Scientist at KLA Texas
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Computer simulations, Extreme ultraviolet lithography, Optical proximity correction, Failure analysis, Stochastic processes, Model-based design

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Stochastic processes

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Computer simulations, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Stochastic processes, Chemically amplified resists

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Data modeling, Scattering, Calibration, Organic materials, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Modeling and simulation, Stochastic processes, Inorganic hybrid materials, Absorption

Proceedings Article | 3 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Code division multiplexing, Lithography, Diffraction, Reticles, Optical lithography, Lithographic illumination, Scanners, Photomasks, Artificial intelligence, Nanoimprint lithography

Showing 5 of 28 publications
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