Dr. Tristan Bret
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Photomasks, Printing, Extreme ultraviolet, Lithography, Multilayers, Atomic force microscopy, Semiconducting wafers, Optimization (mathematics), Critical dimension metrology, Systems modeling

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Reticles, Mirrors, Atomic force microscopy, Printing, Distortion, Inspection

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Photomasks, Printing, Extreme ultraviolet, Multilayers, Semiconducting wafers, Computer simulations, Critical dimension metrology, Extreme ultraviolet lithography, Reflectivity, Lithography

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Photomasks, Scanning electron microscopy, Extreme ultraviolet, Atomic force microscopy, Semiconducting wafers, Reticles, Inspection, Mirrors, Etching, Printing

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Semiconducting wafers, Photomasks, Printing, Scanning electron microscopy, Atomic force microscopy, Extreme ultraviolet, Inspection, Reticles, Visualization, Extreme ultraviolet lithography

Showing 5 of 13 publications
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