Dr. Tristan Bret
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Multilayers, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Systems modeling

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Mirrors, Reticles, Inspection, Distortion, Atomic force microscopy, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Multilayers, Reflectivity, Computer simulations, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2012 Paper
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Mirrors, Reticles, Etching, Inspection, Atomic force microscopy, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Visualization, Inspection, Atomic force microscopy, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 13 publications
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