Trong Huynh-Bao
at imec
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Electrodes, Metals, Gallium arsenide, Diffusion, Manufacturing, Transistors, Field effect transistors, CMOS technology, Extreme ultraviolet lithography, Design for manufacturability, Nanowires

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