Dr. Tsai-Sheng Gau
Director at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (48)

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Diffraction, Polarization, Polarizers, Image quality, Transmittance, Photomasks, Immersion lithography, Dielectric polarization, Diffraction gratings

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Metrology, Optical lithography, Image processing, Process control, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Performance modeling, 193nm lithography

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Scattering, Calibration, Inspection, 3D modeling, 3D metrology, Wafer inspection, Photomasks, Semiconducting wafers, 3D image processing

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Visual process modeling, Data modeling, Calibration, Diffusion, 3D modeling, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, 3D image processing

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Microscopes, Optical properties, Etching, Quality measurement, Semiconductor manufacturing, Artificial intelligence, Semiconducting wafers, Overlay metrology, Evolutionary algorithms, Chemical mechanical planarization

Showing 5 of 48 publications
Conference Committee Involvement (10)
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Showing 5 of 10 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top