Dr. Tsann-Bim Chiou
Image Scientist at ASML Taiwan Ltd
SPIE Involvement:
Publications (24)

Proceedings Article | 2 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Logic, Optical lithography, Photomasks, Resolution enhancement technologies, Source mask optimization, Optical proximity correction, Metals, Nanoimprint lithography

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photomasks, SRAF, Extreme ultraviolet, Manufacturing, Optical proximity correction, Extreme ultraviolet lithography, Metals, Inspection, Scanning electron microscopy, Metrology

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Light sources, Process control, Image processing, Source mask optimization, Lithography, Critical dimension metrology, Optical proximity correction, Control systems, Overlay metrology, Optical lithography, Eye, Metrology, Electroluminescence

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Metals, Extreme ultraviolet, Optical lithography, Back end of line, Line edge roughness, Image processing, Image segmentation, Lithography, Extreme ultraviolet lithography, Printing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Photomasks, Optical lithography, Extreme ultraviolet, Optical alignment, Source mask optimization, Image processing, Error analysis, Optical proximity correction, Electroluminescence

Showing 5 of 24 publications
Conference Committee Involvement (2)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
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