Dr. Tsukasa Abe
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (36)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Reflectivity, Image quality

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Multilayers, Defect detection, Quartz, Coating, Inspection, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Semiconducting wafers, Signal detection

SPIE Journal Paper | August 21, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Phase measurement, Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Inspection, Quartz, Lithography

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Quartz, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Phase measurement, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | January 22, 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Scanning probe microscopy, Defect detection, Extreme ultraviolet, Surface roughness, Inspection, Photomasks, Defect inspection, Signal analysis, Phase measurement, Signal detection

PROCEEDINGS ARTICLE | October 8, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Defect detection, Inspection, Surface roughness, Photomasks, Extreme ultraviolet, Scanning probe microscopy, Phase measurement, Semiconducting wafers, Signal detection, Defect inspection

Showing 5 of 36 publications
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