Dr. Tsukasa Abe
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (37)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Line width roughness, Extreme ultraviolet, SRAF, Extreme ultraviolet lithography, Tantalum, Scanning electron microscopy, Chromium

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Multilayers, Reflectivity, Microscopes, Image quality

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Multilayers, Quartz, Coating, Extreme ultraviolet, Scanning probe microscopy, Defect detection, Signal detection, Semiconducting wafers, Inspection, Photomasks

SPIE Journal Paper | August 21, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Phase measurement, Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Extreme ultraviolet lithography, Signal detection, Inspection, Quartz, Lithography

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Photomasks, Semiconducting wafers, Phase measurement, Lithography, Quartz, Inspection, Extreme ultraviolet lithography, Scanning probe microscopy

SPIE Journal Paper | January 22, 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Scanning probe microscopy, Defect detection, Extreme ultraviolet, Surface roughness, Inspection, Photomasks, Defect inspection, Signal analysis, Phase measurement, Signal detection

Showing 5 of 37 publications
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